E-beam lthography 를 이용한 나노 부유 게이트 소자 제작 = Fabrication of nano-floating gate memory device using E-beam lithography

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dc.contributor.advisor권영세-
dc.contributor.advisorKwon, Young-Se-
dc.contributor.author박진성-
dc.contributor.authorPark, Jin-Sung-
dc.date.accessioned2011-12-14T01:41:11Z-
dc.date.available2011-12-14T01:41:11Z-
dc.date.issued1997-
dc.identifier.urihttp://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=128590&flag=dissertation-
dc.identifier.urihttp://hdl.handle.net/10203/36997-
dc.description학위논문(석사) - 한국과학기술원 : 전기및전자공학과, 1997.8, [ [iii], 54, xix p. ]-
dc.languagekor-
dc.publisher한국과학기술원-
dc.titleE-beam lthography 를 이용한 나노 부유 게이트 소자 제작 = Fabrication of nano-floating gate memory device using E-beam lithography-
dc.typeThesis(Master)-
dc.identifier.CNRN128590/325007-
dc.description.department한국과학기술원 : 전기및전자공학과, -
dc.identifier.uid000953240-
dc.contributor.localauthor권영세-
dc.contributor.localauthorKwon, Young-Se-
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EE-Theses_Master(석사논문)
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