Investigation of electron density and temperature in an argon inductively coupled plasma and feasibility of plasma monitoringICP의 전자 밀도와 온도 측정과 플라즈마 모니터링 가능성 연구

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dc.contributor.advisor김영철-
dc.contributor.authorKang, Jin Wook-
dc.contributor.author강진욱-
dc.date.accessioned2024-07-30T19:31:20Z-
dc.date.available2024-07-30T19:31:20Z-
dc.date.issued2024-
dc.identifier.urihttp://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=1096774&flag=dissertationen_US
dc.identifier.urihttp://hdl.handle.net/10203/321556-
dc.description학위논문(석사) - 한국과학기술원 : 원자력및양자공학과, 2024.2,[vi, 72 p. :]-
dc.description.abstractIn semiconductor etching processes, plasma parameters such as plasma density and electron temperature, are important factors which affect the processing outcomes. Monitoring such parameters is crucial as the etching processes are becoming more complex. This work conducts a feasibility study on non-intrusive plasma monitoring in a two-chamber argon inductively coupled plasma. As a non-intrusive diagnostic tool, a VI probe was used to measure the voltage and current waveforms induced on the antenna of the ICP. To measure the plasma parameters in both the source and the expanding region, cut-off probes were used to measure plasma density whereas Langmuir probes were used to measure electron temperature. To investigate the effect of capacitive coupling on plasma parameters, measurements with and without a Faraday shield were compared. For plasma monitoring, a circuit model using Bayesian probability theory was investigated, and its limitations are discussed. As a better alternative, a neural network was constructed to infer plasma parameters and the results are presented.-
dc.languageeng-
dc.publisher한국과학기술원-
dc.subject유도 결합 플라즈마▼a패러데이 실드▼a컷오프 프로브▼a랭뮤어 프로브▼a전압 & 전류 프로브▼a인공 신경망-
dc.subjectInductively coupled plasma▼aFaraday shield▼aCutoff probe▼aLangmuir probe▼aVI probe▼aNeural network-
dc.titleInvestigation of electron density and temperature in an argon inductively coupled plasma and feasibility of plasma monitoring-
dc.title.alternativeICP의 전자 밀도와 온도 측정과 플라즈마 모니터링 가능성 연구-
dc.typeThesis(Master)-
dc.identifier.CNRN325007-
dc.description.department한국과학기술원 :원자력및양자공학과,-
dc.contributor.alternativeauthorGhim, Young-chul-
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