DC Field | Value | Language |
---|---|---|
dc.contributor.advisor | Kim, Jin-Baek | - |
dc.contributor.advisor | 김진백 | - |
dc.contributor.author | Min, Chang-Su | - |
dc.contributor.author | 민창수 | - |
dc.date.accessioned | 2011-12-13T04:51:35Z | - |
dc.date.available | 2011-12-13T04:51:35Z | - |
dc.date.issued | 2009 | - |
dc.identifier.uri | http://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=308936&flag=dissertation | - |
dc.identifier.uri | http://hdl.handle.net/10203/32106 | - |
dc.description | 학위논문(석사) - 한국과학기술원 : 화학과, 2009.2, [ vi, 38 p. ] | - |
dc.description.abstract | Curing imprint lithography (UV or thermal) has emerged as a less expensive alternative to print nano-scale features. But typical imprint resists is difficult to degrade because of highly cross-linking. By designing a resist in which all of the cross-linkers are cleavable under mild acid conditions, we would require only a simple degradation step to remove the film after imprinting. In this study, methacylate monomers containing tertiary ester linkages and hydroxyl groups were copolymerized with diazoketo-functionalized monomers, and then polymers were coated on substrate with a photoacid generator. Polymers were patterned with thermal imprint lithography to create cross-linked films through hydroxyl-diazoketo linkages. Films could be Sequential patterned in a subsequent photolithography step by thermal and acid-catalyzed decomposition of tertiary ester linkages. We introduce the combination of thermal imprint and photolithography into a single system. | eng |
dc.language | eng | - |
dc.publisher | 한국과학기술원 | - |
dc.subject | Photolithography | - |
dc.subject | Thermal imprint lithography | - |
dc.subject | patterning | - |
dc.subject | 포토리소그래피 | - |
dc.subject | 열 임프린트 | - |
dc.subject | 패터닝 | - |
dc.subject | Photolithography | - |
dc.subject | Thermal imprint lithography | - |
dc.subject | patterning | - |
dc.subject | 포토리소그래피 | - |
dc.subject | 열 임프린트 | - |
dc.subject | 패터닝 | - |
dc.title | Dual responsive materials for sequential patterning by thermal imprint and photolithography | - |
dc.title.alternative | 열 임프린트와 포토리소그래피로 순차적인 패터닝이 가능한 이중반응성 물질에 관한 연구 | - |
dc.type | Thesis(Master) | - |
dc.identifier.CNRN | 308936/325007 | - |
dc.description.department | 한국과학기술원 : 화학과, | - |
dc.identifier.uid | 020073171 | - |
dc.contributor.localauthor | Kim, Jin-Baek | - |
dc.contributor.localauthor | 김진백 | - |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.