Thiophene-based boron chelators and the modeling of VX-metal ion chelation티오펜 붕소 배위자와 VX 금속 이온 배위자 모델에 관한 연구

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dc.contributor.advisorChurchill, David G.-
dc.contributor.advisor처칠, 데이비드-
dc.contributor.authorKim, Min-Jeong-
dc.contributor.author김민정-
dc.date.accessioned2011-12-13T04:51:20Z-
dc.date.available2011-12-13T04:51:20Z-
dc.date.issued2006-
dc.identifier.urihttp://library.kaist.ac.kr/search/detail/view.do?bibCtrlNo=301343&flag=dissertation-
dc.identifier.urihttp://hdl.handle.net/10203/32089-
dc.description학위논문(석사) - 한국과학기술원 : 화학과, 2006.2, [ iv, 51 p. ]-
dc.description.abstractWe have explored novel metal chelation units that utilize stabilizing internal hydrogen bonding networks as in the 2,3-dihydroxy-terephthalamide type chelation units. Three novel 3,4-dihydroxy-2,5-dicarboxy-thiophene systems: 5-hexylcarbamoyl-3,4-dihydroxy-thiophene-2-carboxylic acid methyl ester (5), 3-benzyloxy-4-hydroxy-thiophene-2,5-dicarboxylic acid bis-hexylamide (6), and 3,4-dihydroxy-thiophene-2, 5-dicarboxylic acid bis-hexylamide (7) were prepared. Boron chelation with these units has also been performed and characterized.eng
dc.languageeng-
dc.publisher한국과학기술원-
dc.subjectboron chelator-
dc.subjectVX nerve agent-
dc.subjectmetal chelation-
dc.subject붕소 배위자-
dc.subjectVX 신경물질-
dc.subject금속 킬레이션-
dc.subjectboron chelator-
dc.subjectVX nerve agent-
dc.subjectmetal chelation-
dc.subject붕소 배위자-
dc.subjectVX 신경물질-
dc.subject금속 킬레이션-
dc.titleThiophene-based boron chelators and the modeling of VX-metal ion chelation-
dc.title.alternative티오펜 붕소 배위자와 VX 금속 이온 배위자 모델에 관한 연구-
dc.typeThesis(Master)-
dc.identifier.CNRN301343/325007 -
dc.description.department한국과학기술원 : 화학과, -
dc.identifier.uid020043076-
dc.contributor.localauthorChurchill, David G.-
dc.contributor.localauthor처칠, 데이비드-
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