DC Field | Value | Language |
---|---|---|
dc.contributor.author | Hong, JeeHyun | ko |
dc.contributor.author | Jung, Yeon Sik | ko |
dc.date.accessioned | 2024-01-09T00:00:20Z | - |
dc.date.available | 2024-01-09T00:00:20Z | - |
dc.date.created | 2024-01-08 | - |
dc.date.issued | 2023-11-29 | - |
dc.identifier.citation | 2023 MRS Fall Meeting & Exhibit | - |
dc.identifier.uri | http://hdl.handle.net/10203/317553 | - |
dc.language | English | - |
dc.publisher | Mateiral Research Society | - |
dc.title | Development of silicon-gradient block copolymers as EUV lithography inorganic pattern masks | - |
dc.type | Conference | - |
dc.type.rims | CONF | - |
dc.citation.publicationname | 2023 MRS Fall Meeting & Exhibit | - |
dc.identifier.conferencecountry | US | - |
dc.identifier.conferencelocation | Boston, MA | - |
dc.contributor.localauthor | Jung, Yeon Sik | - |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.