In-situ monolithic integration of nanobeam laser with passive waveguide on SOI

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We demonstrate in-situ monolithic integration of an InP-based nanobeam laser and a passive waveguide on SOI using selective quantum well etching technique. The device on SOI platform is realized by employing transfer printing process.
Publisher
Institute of Electrical and Electronics Engineers Inc.
Issue Date
2015-08
Language
English
Citation

11th Conference on Lasers and Electro-Optics Pacific Rim, CLEO-PR 2015

DOI
10.1109/CLEOPR.2015.7376554
URI
http://hdl.handle.net/10203/315007
Appears in Collection
PH-Conference Papers(학술회의논문)
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