Concurrent inverse design of structured light and metasurface for nanopatterning process
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Kim, Myungjoon | ko |
| dc.contributor.author | Kim, Nayoung | ko |
| dc.contributor.author | Shin, Jonghwa | ko |
| dc.date.accessioned | 2023-08-31T11:00:45Z | - |
| dc.date.available | 2023-08-31T11:00:45Z | - |
| dc.date.created | 2023-02-24 | - |
| dc.date.issued | 2022-10 | - |
| dc.identifier.citation | Frontiers in Optics, FiO 2022 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/312087 | - |
| dc.description.abstract | We demonstrate an adjoint-based concurrent optimization method for an incident wavefront and metasurface pair that can outperform the previous metasurfaces used for interference-based nanofabrication processes. | - |
| dc.language | English | - |
| dc.publisher | Optica Publishing Group (formerly OSA) | - |
| dc.title | Concurrent inverse design of structured light and metasurface for nanopatterning process | - |
| dc.type | Conference | - |
| dc.identifier.scopusid | 2-s2.0-85146740714 | - |
| dc.type.rims | CONF | - |
| dc.citation.publicationname | Frontiers in Optics, FiO 2022 | - |
| dc.identifier.conferencecountry | US | - |
| dc.identifier.conferencelocation | Rochester, New York | - |
| dc.contributor.localauthor | Shin, Jonghwa | - |
| dc.contributor.nonIdAuthor | Kim, Myungjoon | - |
| dc.contributor.nonIdAuthor | Kim, Nayoung | - |
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