Synthesis of graphene layers by inductive coupled plasma enhanced chemical vapor deposition (ICP-CVD) for application in optoelectronics
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Thant, Aye Aye | ko |
| dc.contributor.author | Jung, Dae-Yool | ko |
| dc.contributor.author | Lee, Jung-Yong | ko |
| dc.contributor.author | Choi, Sung-Yool | ko |
| dc.date.accessioned | 2023-08-15T03:00:58Z | - |
| dc.date.available | 2023-08-15T03:00:58Z | - |
| dc.date.created | 2023-07-07 | - |
| dc.date.issued | 2019-11 | - |
| dc.identifier.citation | Photonics for Energy, PFE_2019 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/311520 | - |
| dc.description.abstract | The thin films of Ni and Cu have been deposited on SiO2/Si(100) substrates in a thermal evaporator. The graphene layers have been grown on Ni-Cu films under C2H2-H2Ar plasma under vacuum annealing condition in ICP-CVD. | - |
| dc.language | English | - |
| dc.publisher | OSA - The Optical Society | - |
| dc.title | Synthesis of graphene layers by inductive coupled plasma enhanced chemical vapor deposition (ICP-CVD) for application in optoelectronics | - |
| dc.type | Conference | - |
| dc.identifier.scopusid | 2-s2.0-85084446784 | - |
| dc.type.rims | CONF | - |
| dc.citation.publicationname | Photonics for Energy, PFE_2019 | - |
| dc.identifier.conferencecountry | CC | - |
| dc.identifier.conferencelocation | Wuhan | - |
| dc.contributor.localauthor | Choi, Sung-Yool | - |
| dc.contributor.nonIdAuthor | Thant, Aye Aye | - |
| dc.contributor.nonIdAuthor | Lee, Jung-Yong | - |
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