DC Field | Value | Language |
---|---|---|
dc.contributor.author | Lee, Geon-Beom | ko |
dc.contributor.author | Kim, Jeong-Yeon | ko |
dc.contributor.author | Choi, Yang-Kyu | ko |
dc.date.accessioned | 2023-06-21T06:02:13Z | - |
dc.date.available | 2023-06-21T06:02:13Z | - |
dc.date.created | 2023-06-21 | - |
dc.date.created | 2023-06-21 | - |
dc.date.issued | 2023-05 | - |
dc.identifier.citation | IEEE ELECTRON DEVICE LETTERS, v.44, no.5, pp.709 - 712 | - |
dc.identifier.issn | 0741-3106 | - |
dc.identifier.uri | http://hdl.handle.net/10203/307411 | - |
dc.description.abstract | A charge pumping (CP) technique with gate-induced drain leakage (GIDL) current is proposed to extract interface trap density ( ${N}_{\text {it}}{)}$ in GAA MOSFETs. This GIDL CP characterizes the ${N}_{\text {it}}$ even for an advanced MOSFET with a floating body, small size and a thin gate dielectric, which are difficult to analyze by a conventional CP technique. Using LabVIEW control, a synchronized voltage pulse was automated, and the generated holes were effectively recombined with the traps for ${N}_{\text {it}}$ extraction. In addition, the proposed CP was confirmed to be an analysis tool that can reliably extract the ${N}_{\text {it}}$ while minimizing device stress during the measurement. | - |
dc.language | English | - |
dc.publisher | IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC | - |
dc.title | A Novel Charge Pumping Technique With Gate-Induced Drain Leakage Current | - |
dc.type | Article | - |
dc.identifier.wosid | 000980442400002 | - |
dc.identifier.scopusid | 2-s2.0-85151496780 | - |
dc.type.rims | ART | - |
dc.citation.volume | 44 | - |
dc.citation.issue | 5 | - |
dc.citation.beginningpage | 709 | - |
dc.citation.endingpage | 712 | - |
dc.citation.publicationname | IEEE ELECTRON DEVICE LETTERS | - |
dc.identifier.doi | 10.1109/LED.2023.3258454 | - |
dc.contributor.localauthor | Choi, Yang-Kyu | - |
dc.contributor.nonIdAuthor | Kim, Jeong-Yeon | - |
dc.description.isOpenAccess | N | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordAuthor | Logic gates | - |
dc.subject.keywordAuthor | Gallium arsenide | - |
dc.subject.keywordAuthor | Stress | - |
dc.subject.keywordAuthor | Optical pumping | - |
dc.subject.keywordAuthor | Optical pulses | - |
dc.subject.keywordAuthor | Current measurement | - |
dc.subject.keywordAuthor | Human computer interaction | - |
dc.subject.keywordAuthor | Charge pumping (CP) | - |
dc.subject.keywordAuthor | gate-all-around (GAA) | - |
dc.subject.keywordAuthor | Index Terms | - |
dc.subject.keywordAuthor | gate dielectric | - |
dc.subject.keywordAuthor | gate-induced drain leakage (GIDL) | - |
dc.subject.keywordAuthor | interface trap | - |
dc.subject.keywordAuthor | metal-oxide-silicon field-effect transistor (MOSFET) | - |
dc.subject.keywordPlus | INTERFACE-TRAP DENSITY | - |
dc.subject.keywordPlus | EXTRACTION | - |
dc.subject.keywordPlus | MOSFETS | - |
Items in DSpace are protected by copyright, with all rights reserved, unless otherwise indicated.