Configurable Crack Wall Conduction in a Complex Oxide

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dc.contributor.authorYeo, Youngkiko
dc.contributor.authorHwang, Soo-Yoonko
dc.contributor.authorYeo, Jinwookko
dc.contributor.authorKim, Jihunko
dc.contributor.authorJang, Jinhyukko
dc.contributor.authorPark, Heung-Sikko
dc.contributor.authorKim, Yong-Jinko
dc.contributor.authorLe, Duc Duyko
dc.contributor.authorSong, Kyungko
dc.contributor.authorKim, Moonhongko
dc.contributor.authorRyu, Seunghwako
dc.contributor.authorChoi, Si-Youngko
dc.contributor.authorYang, Chan-Hoko
dc.date.accessioned2023-02-07T01:01:21Z-
dc.date.available2023-02-07T01:01:21Z-
dc.date.created2023-01-28-
dc.date.created2023-01-28-
dc.date.issued2023-01-
dc.identifier.citationNANO LETTERS, v.23, no.2, pp.398 - 406-
dc.identifier.issn1530-6984-
dc.identifier.urihttp://hdl.handle.net/10203/305051-
dc.description.abstractMobile defects in solid-state materials play a significant role in memristive switching and energy-efficient neuromorphic computation. Techniques for confining and manipulating point defects may have great promise for low-dimensional memories. Here, we report the spontaneous gathering of oxygen vacancies at strain-relaxed crack walls in SrTiO3 thin films grown on DyScO3 substrates as a result of flexoelectricity. We found that electronic conductance at the crack walls was enhanced compared to the crack-free region, by a factor of 104. A switchable asymmetric diode-like feature was also observed, and the mechanism is discussed, based on the electrical migration of oxygen vacancy donors in the background of Sr-deficient acceptors forming n+-n or n-n+ junctions. By tracing the temporal relaxations of surface potential and lattice expansion of a formed region, we determine the diffusivity of mobile defects in crack walls to be 1.4 x 10-16 cm2/s, which is consistent with oxygen vacancy kinetics.-
dc.languageEnglish-
dc.publisherAMER CHEMICAL SOC-
dc.titleConfigurable Crack Wall Conduction in a Complex Oxide-
dc.typeArticle-
dc.identifier.wosid000908820200001-
dc.identifier.scopusid2-s2.0-85145989683-
dc.type.rimsART-
dc.citation.volume23-
dc.citation.issue2-
dc.citation.beginningpage398-
dc.citation.endingpage406-
dc.citation.publicationnameNANO LETTERS-
dc.identifier.doi10.1021/acs.nanolett.2c02640-
dc.contributor.localauthorRyu, Seunghwa-
dc.contributor.localauthorYang, Chan-Ho-
dc.contributor.nonIdAuthorHwang, Soo-Yoon-
dc.contributor.nonIdAuthorJang, Jinhyuk-
dc.contributor.nonIdAuthorLe, Duc Duy-
dc.contributor.nonIdAuthorSong, Kyung-
dc.contributor.nonIdAuthorKim, Moonhong-
dc.contributor.nonIdAuthorChoi, Si-Young-
dc.description.isOpenAccessN-
dc.type.journalArticleArticle-
dc.subject.keywordAuthorcracks-
dc.subject.keywordAuthorcrack wall conduction-
dc.subject.keywordAuthoroxygen vacancy-
dc.subject.keywordAuthoroxide nanoelectronics-
dc.subject.keywordAuthorSrTiO3-
dc.subject.keywordPlusROOM-TEMPERATURE FERROELECTRICITY-
dc.subject.keywordPlusDOMAIN-WALLS-
dc.subject.keywordPlusTRANSITION-
dc.subject.keywordPlusSRTIO3-
dc.subject.keywordPlusPOLARIZATION-
dc.subject.keywordPlusINTERFACE-
dc.subject.keywordPlusGROWTH-
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ME-Journal Papers(저널논문)PH-Journal Papers(저널논문)
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