Nanoscale interface engineering for solid oxide fuel cells using atomic layer deposition

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dc.contributor.authorSeo, Jongsuko
dc.contributor.authorKim, Seunghyunko
dc.contributor.authorJeon, SungHyunko
dc.contributor.authorKim, Suyeonko
dc.contributor.authorKim, Jeong Hwanko
dc.contributor.authorJung, WooChulko
dc.date.accessioned2022-02-20T06:41:34Z-
dc.date.available2022-02-20T06:41:34Z-
dc.date.created2022-02-06-
dc.date.created2022-02-06-
dc.date.created2022-02-06-
dc.date.created2022-02-06-
dc.date.issued2022-02-
dc.identifier.citationNANOSCALE ADVANCES, v.4, no.4, pp.1060 - 1073-
dc.identifier.issn2516-0230-
dc.identifier.urihttp://hdl.handle.net/10203/292302-
dc.description.abstractAtomic layer deposition (ALD), which is already actively used in the semiconductor industry, has been in the spotlight in various energy fields, such as batteries and fuel cells, given its unique ability to enable the nanoscale deposition of diverse materials with a variety of compositions onto complex 3D structures. In particular, with regard to ceramic fuel cells, ALD has attracted attention because it facilitates the manufacturing of thin and dense electrolytes. Furthermore, recently, electrode surfaces and electrode/electrolyte interface modification are arising as new research strategies to fabricate robust fuel cells. In this mini-review, we present a brief overview of ALD and recent studies that utilize ALD in ceramic fuel cells, such as manufacturing thin film electrolytes, stabilizing electrodes, functionalizing electrodes, and modifying the chemistry of electrode surfaces. We also propose research directions to expand the utility and functionality of the ALD techniques.-
dc.languageEnglish-
dc.publisherROYAL SOC CHEMISTRY-
dc.titleNanoscale interface engineering for solid oxide fuel cells using atomic layer deposition-
dc.typeArticle-
dc.identifier.wosid000744943500001-
dc.identifier.scopusid2-s2.0-85124799873-
dc.type.rimsART-
dc.citation.volume4-
dc.citation.issue4-
dc.citation.beginningpage1060-
dc.citation.endingpage1073-
dc.citation.publicationnameNANOSCALE ADVANCES-
dc.identifier.doi10.1039/d1na00852h-
dc.contributor.localauthorJung, WooChul-
dc.contributor.nonIdAuthorKim, Suyeon-
dc.contributor.nonIdAuthorKim, Jeong Hwan-
dc.description.isOpenAccessN-
dc.type.journalArticleReview-
dc.subject.keywordPlusYTTRIA-STABILIZED ZIRCONIA-
dc.subject.keywordPlusOXYGEN REDUCTION REACTION-
dc.subject.keywordPlusSURFACE SR SEGREGATION-
dc.subject.keywordPlusTHIN-FILM-
dc.subject.keywordPlusLOW-TEMPERATURE-
dc.subject.keywordPlusPEROVSKITE OXIDES-
dc.subject.keywordPlusHETEROGENEOUS CATALYSTS-
dc.subject.keywordPlusELECTRICAL DEFECTS-
dc.subject.keywordPlusNEXT-GENERATION-
dc.subject.keywordPlusSOFC CATHODES-
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