2D-3D heterojunction tunnel field-effect transistor자연 헤테로 접합 터널 전계 효과 트랜지스터

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dc.contributor.authorCho, Sungjaeko
dc.date.accessioned2021-12-02T06:46:42Z-
dc.date.available2021-12-02T06:46:42Z-
dc.identifier.urihttp://hdl.handle.net/10203/289895-
dc.description.abstractDisclosed is a 2D-3D HJ-TFET made of a material, the band gap of which changes according to the thickness, such as black phosphorous or TMDC, in order to extend Moore's law. More particularly, disclosed are the structure of a 2D-3D HJ-TFET and a method for manufacturing the same, wherein the 2D-3D HJ-TFET is made of a material such as black phosphorous or TMDC such that the same consumes less power, has a high switching speed, can operate in a complementary manner so as to replace a conventional CMOS transistor, and can extend Moore's law.-
dc.title2D-3D heterojunction tunnel field-effect transistor-
dc.title.alternative자연 헤테로 접합 터널 전계 효과 트랜지스터-
dc.typePatent-
dc.type.rimsPAT-
dc.contributor.localauthorCho, Sungjae-
dc.contributor.assigneeKAIST-
dc.identifier.iprsType특허-
dc.identifier.patentApplicationNumber16930422-
dc.identifier.patentRegistrationNumber11121243-
dc.date.application2020-07-16-
dc.date.registration2021-09-14-
dc.publisher.countryUS-
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PH-Patent(특허)
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