According to an aspect of the present invention, there is provided a method of detecting a pattern structure, the method including: irradiating a sample including a pattern region on which a structure having a certain pattern is formed on a substrate with a wave from a wave source; collecting speckle (speckle) information formed by multiple diffraction in the pattern region by an information collecting unit; and comparing the collected information with reference information, and analyzing whether the structure formed on the pattern region is abnormal or not.