Pattern structure inspection device and inspection method패턴 구조물 검사 장치 및 검사 방법

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According to an aspect of the present invention, there is provided a method of detecting a pattern structure, the method including: irradiating a sample including a pattern region on which a structure having a certain pattern is formed on a substrate with a wave from a wave source; collecting speckle (speckle) information formed by multiple diffraction in the pattern region by an information collecting unit; and comparing the collected information with reference information, and analyzing whether the structure formed on the pattern region is abnormal or not.
Assignee
KAIST
Country
CC (Cocos (Keeling) Islands)
Application Date
2017-06-01
Application Number
201780034467.X
Registration Date
2021-11-05
Registration Number
109313139
URI
http://hdl.handle.net/10203/289167
Appears in Collection
PH-Patent(특허)
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