Ferroelectricity in CMOS-Compatible Hafnium Oxides Reviving the ferroelectric field-effect transistor technology

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Publisher
IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC
Issue Date
2021-10
Language
English
Article Type
Article
Citation

IEEE NANOTECHNOLOGY MAGAZINE, v.15, no.5, pp.20 - 32

ISSN
1932-4510
DOI
10.1109/MNANO.2021.3098218
URI
http://hdl.handle.net/10203/287995
Appears in Collection
RIMS Journal Papers
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