Peculiarities of relief formation under InP surface sputtering will argon ions and atoms

Abstract

Processes of relief formation on indium phosphide under sputtering by ion and atomic argon beam have been investigated. It is shown that depending on argon beam power density and target temperature the surface morphology formed can be either 'grass' or 'cone-in-pit' type. A quality model of surface morphology changing has been presented. The obtained results permit to explain the phenomenon of the morphology type variation.