DC Field | Value | Language |
---|---|---|
dc.contributor.author | Park, JY | ko |
dc.contributor.author | Lera, JD | ko |
dc.contributor.author | Choi, HJ | ko |
dc.contributor.author | Buh, GH | ko |
dc.contributor.author | Kang, CJ | ko |
dc.contributor.author | Jung, JH | ko |
dc.contributor.author | Choi, SS | ko |
dc.contributor.author | Jeon, D | ko |
dc.contributor.author | Kuk, Y | ko |
dc.date.accessioned | 2021-03-15T08:50:06Z | - |
dc.date.available | 2021-03-15T08:50:06Z | - |
dc.date.created | 2020-12-27 | - |
dc.date.issued | 1998-03 | - |
dc.identifier.citation | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures, v.16, no.2, pp.826 - 828 | - |
dc.identifier.issn | 1071-1023 | - |
dc.identifier.uri | http://hdl.handle.net/10203/281549 | - |
dc.description.abstract | A two by two electron microcolumn array aligned with held emission array (FEA) was fabricated based on our electron-beam simulation. The spherical and chromatic aberrations, that affect the spot size of the e-beam, are highly dependent on the alignment of the electrostatic microlenses. A laser micromachining technique was used for making a self-aligned microcolumn. A FEA with a designed size and spacing was aligned and bonded to the microcolumn. The I-V and current stabilities of the microcolumn were measured and the field emission pattern of highly focused e-beam was obtained. The application of focused electron beam or ion beam for lithography and miniaturized scanning electron microscopy are suggested, (C) 1998 American Vacuum Society. [S0734-211X(98)08602-8]. | - |
dc.language | English | - |
dc.publisher | American Institute of Physics | - |
dc.title | Characterization of two by two electron-beam microcolumn array aligned with field emission array | - |
dc.type | Article | - |
dc.identifier.wosid | 000073167200075 | - |
dc.identifier.scopusid | 2-s2.0-0011653815 | - |
dc.type.rims | ART | - |
dc.citation.volume | 16 | - |
dc.citation.issue | 2 | - |
dc.citation.beginningpage | 826 | - |
dc.citation.endingpage | 828 | - |
dc.citation.publicationname | Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures | - |
dc.identifier.doi | 10.1116/1.589915 | - |
dc.contributor.localauthor | Park, JY | - |
dc.contributor.nonIdAuthor | Lera, JD | - |
dc.contributor.nonIdAuthor | Choi, HJ | - |
dc.contributor.nonIdAuthor | Buh, GH | - |
dc.contributor.nonIdAuthor | Kang, CJ | - |
dc.contributor.nonIdAuthor | Jung, JH | - |
dc.contributor.nonIdAuthor | Choi, SS | - |
dc.contributor.nonIdAuthor | Jeon, D | - |
dc.contributor.nonIdAuthor | Kuk, Y | - |
dc.description.isOpenAccess | N | - |
dc.type.journalArticle | Article; Proceedings Paper | - |
dc.subject.keywordPlus | EMITTER ARRAYS | - |
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