DC Field | Value | Language |
---|---|---|
dc.contributor.author | Byun, Kyung-Eun | ko |
dc.contributor.author | Chung, Hyun-Jong | ko |
dc.contributor.author | Lee, Jaeho | ko |
dc.contributor.author | Yang, Heejun | ko |
dc.contributor.author | Song, Hyun Jae | ko |
dc.contributor.author | Heo, Jinseong | ko |
dc.contributor.author | Seo, David H. | ko |
dc.contributor.author | Park, Seongjun | ko |
dc.contributor.author | Hwang, Sung Woo | ko |
dc.contributor.author | Yoo, InKyeong | ko |
dc.contributor.author | Kim, Kinam | ko |
dc.date.accessioned | 2021-01-28T06:14:10Z | - |
dc.date.available | 2021-01-28T06:14:10Z | - |
dc.date.created | 2021-01-26 | - |
dc.date.created | 2021-01-26 | - |
dc.date.issued | 2013-09 | - |
dc.identifier.citation | NANO LETTERS, v.13, no.9, pp.4001 - 4005 | - |
dc.identifier.issn | 1530-6984 | - |
dc.identifier.uri | http://hdl.handle.net/10203/280232 | - |
dc.description.abstract | The rectifying Schottky characteristics of the metal-semiconductor junction with high contact resistance have been a serious issue in modern electronic devices. Herein, we demonstrated the conversion of the Schottky nature of the Ni-Si junction, one of the most commonly used metal-semiconductor junctions, into an Ohmic contact with low contact resistance by inserting a single layer of graphene. The contact resistance achieved from the junction incorporating graphene was about 10(-8) similar to 10(-9) Omega cm(2) at a Si doping concentration of 10(17) cm(-3). | - |
dc.language | English | - |
dc.publisher | AMER CHEMICAL SOC | - |
dc.title | Graphene for True Ohmic Contact at Metal-Semiconductor Junctions | - |
dc.type | Article | - |
dc.identifier.wosid | 000330158900007 | - |
dc.identifier.scopusid | 2-s2.0-84884249960 | - |
dc.type.rims | ART | - |
dc.citation.volume | 13 | - |
dc.citation.issue | 9 | - |
dc.citation.beginningpage | 4001 | - |
dc.citation.endingpage | 4005 | - |
dc.citation.publicationname | NANO LETTERS | - |
dc.identifier.doi | 10.1021/nl402367y | - |
dc.contributor.localauthor | Yang, Heejun | - |
dc.contributor.nonIdAuthor | Byun, Kyung-Eun | - |
dc.contributor.nonIdAuthor | Chung, Hyun-Jong | - |
dc.contributor.nonIdAuthor | Lee, Jaeho | - |
dc.contributor.nonIdAuthor | Song, Hyun Jae | - |
dc.contributor.nonIdAuthor | Heo, Jinseong | - |
dc.contributor.nonIdAuthor | Seo, David H. | - |
dc.contributor.nonIdAuthor | Park, Seongjun | - |
dc.contributor.nonIdAuthor | Hwang, Sung Woo | - |
dc.contributor.nonIdAuthor | Yoo, InKyeong | - |
dc.contributor.nonIdAuthor | Kim, Kinam | - |
dc.description.isOpenAccess | N | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordAuthor | Graphene | - |
dc.subject.keywordAuthor | metal-semiconductor junction | - |
dc.subject.keywordAuthor | Ohmic contact | - |
dc.subject.keywordAuthor | Schottky barrier | - |
dc.subject.keywordAuthor | Ni-Si junction | - |
dc.subject.keywordPlus | SCHOTTKY-BARRIER | - |
dc.subject.keywordPlus | SILICON | - |
dc.subject.keywordPlus | TRANSISTORS | - |
dc.subject.keywordPlus | TRANSPORT | - |
dc.subject.keywordPlus | FILMS | - |
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