Negative Bias Illumination Stress(NBIS) Stability Analysis of MoS2 Thin-Film Transistor(TFT)
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Oh, Dong-Sik | ko |
| dc.contributor.author | Kang, Ju-Yeon | ko |
| dc.contributor.author | Park, Hamin | ko |
| dc.contributor.author | Shin, Gwang-Hyuk | ko |
| dc.contributor.author | Hong, Woonggi | ko |
| dc.contributor.author | Im, Sung-Gap | ko |
| dc.contributor.author | Choi, Sung-Yool | ko |
| dc.date.accessioned | 2020-12-19T05:30:19Z | - |
| dc.date.available | 2020-12-19T05:30:19Z | - |
| dc.date.created | 2020-12-04 | - |
| dc.date.created | 2020-12-04 | - |
| dc.date.issued | 2019-10-08 | - |
| dc.identifier.citation | RPGR 2019: Recent Progress in Graphene and Two-dimensional Materials Research Conference | - |
| dc.identifier.uri | http://hdl.handle.net/10203/278760 | - |
| dc.language | English | - |
| dc.publisher | Recent Progress in Graphene and Two-dimensional Materials Research | - |
| dc.title | Negative Bias Illumination Stress(NBIS) Stability Analysis of MoS2 Thin-Film Transistor(TFT) | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.publicationname | RPGR 2019: Recent Progress in Graphene and Two-dimensional Materials Research Conference | - |
| dc.identifier.conferencecountry | JA | - |
| dc.identifier.conferencelocation | Matsue | - |
| dc.contributor.localauthor | Choi, Sung-Yool | - |
| dc.contributor.nonIdAuthor | Oh, Dong-Sik | - |
| dc.contributor.nonIdAuthor | Kang, Ju-Yeon | - |
| dc.contributor.nonIdAuthor | Park, Hamin | - |
| dc.contributor.nonIdAuthor | Shin, Gwang-Hyuk | - |
| dc.contributor.nonIdAuthor | Hong, Woonggi | - |
| dc.contributor.nonIdAuthor | Im, Sung-Gap | - |
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