DC Field | Value | Language |
---|---|---|
dc.contributor.author | Lee, KS | ko |
dc.contributor.author | Kim, RH | ko |
dc.contributor.author | Prabhakaran, P. | ko |
dc.contributor.author | Yang, Dong-Yol | ko |
dc.contributor.author | Lim, TW | ko |
dc.contributor.author | Park, SH | ko |
dc.date.accessioned | 2008-01-15T08:28:37Z | - |
dc.date.available | 2008-01-15T08:28:37Z | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2007-03 | - |
dc.identifier.citation | JOURNAL OF NONLINEAR OPTICAL PHYSICS & MATERIALS, v.16, pp.59 - 73 | - |
dc.identifier.issn | 0218-8635 | - |
dc.identifier.uri | http://hdl.handle.net/10203/2769 | - |
dc.description.abstract | Two-photon stereolithography based on photopolymerization provides the ability to fabricate real three-dimensional (3D) microstructures beyond the resolution of focal size. In this paper, our recent research focusing on improvement of spatial resolution in two-photon stereolithography is reviewed. The influence of system and fabrication conditions in relation to the spatial resolution is discussed. For small and low aspect ratio voxels, a minimum power and minimum exposure time (MPMT) scheme is introduced. During the two-photon process, an ascending technique, wherein the truncation amount of volumetric pixels is controlled, can be applied to improve the resolution of two-dimensional patterns. 3D Microfabrication with less than 100 nm resolution can be realized by using the radical quenching effect. After the two-photon process, the resolution of fabricated patterns can be refined to 60 nm by post-processing of plasma ashing. | - |
dc.language | English | - |
dc.language.iso | en_US | en |
dc.publisher | WORLD SCIENTIFIC PUBL CO PTE LTD | - |
dc.subject | 3-DIMENSIONAL MICROFABRICATION | - |
dc.subject | SPATIAL-RESOLUTION | - |
dc.subject | PHOTOPOLYMERIZATION | - |
dc.subject | POLYMERIZATION | - |
dc.subject | FABRICATION | - |
dc.subject | MICROSTRUCTURES | - |
dc.subject | NANOFABRICATION | - |
dc.subject | VOXELS | - |
dc.title | Two-photon stereolithography | - |
dc.type | Article | - |
dc.identifier.wosid | 000250864300005 | - |
dc.identifier.scopusid | 2-s2.0-34249041535 | - |
dc.type.rims | ART | - |
dc.citation.volume | 16 | - |
dc.citation.beginningpage | 59 | - |
dc.citation.endingpage | 73 | - |
dc.citation.publicationname | JOURNAL OF NONLINEAR OPTICAL PHYSICS & MATERIALS | - |
dc.embargo.liftdate | 9999-12-31 | - |
dc.embargo.terms | 9999-12-31 | - |
dc.contributor.localauthor | Yang, Dong-Yol | - |
dc.contributor.nonIdAuthor | Lee, KS | - |
dc.contributor.nonIdAuthor | Kim, RH | - |
dc.contributor.nonIdAuthor | Prabhakaran, P. | - |
dc.contributor.nonIdAuthor | Lim, TW | - |
dc.contributor.nonIdAuthor | Park, SH | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordAuthor | two-photon stereolithography | - |
dc.subject.keywordAuthor | submicro resolution | - |
dc.subject.keywordAuthor | voxels | - |
dc.subject.keywordAuthor | radical quencher | - |
dc.subject.keywordAuthor | oxygen plasma ashing | - |
dc.subject.keywordPlus | 3-DIMENSIONAL MICROFABRICATION | - |
dc.subject.keywordPlus | SPATIAL-RESOLUTION | - |
dc.subject.keywordPlus | PHOTOPOLYMERIZATION | - |
dc.subject.keywordPlus | POLYMERIZATION | - |
dc.subject.keywordPlus | FABRICATION | - |
dc.subject.keywordPlus | MICROSTRUCTURES | - |
dc.subject.keywordPlus | NANOFABRICATION | - |
dc.subject.keywordPlus | VOXELS | - |
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