Performance degradation in graphene-ZnO barristors due to graphene edge contact

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dc.contributor.authorKim, So-Youngko
dc.contributor.authorRyou, Jungako
dc.contributor.authorKim, Min Jaeko
dc.contributor.authorKim, Kiyungko
dc.contributor.authorLee, Yongsuko
dc.contributor.authorKim, Seung-Moko
dc.contributor.authorHwang, Hyeon Junko
dc.contributor.authorKim, Yong-Hoonko
dc.contributor.authorLee, Byoung Hunko
dc.date.accessioned2020-07-21T01:55:23Z-
dc.date.available2020-07-21T01:55:23Z-
dc.date.created2020-06-15-
dc.date.issued2020-06-
dc.identifier.citationACS APPLIED MATERIALS & INTERFACES, v.12, no.25, pp.28768 - 28774-
dc.identifier.issn1944-8244-
dc.identifier.urihttp://hdl.handle.net/10203/275566-
dc.description.abstractThe physical and chemical characteristics of the edge states of graphene have been studied extensively as they affect the electrical properties of graphene significantly. Likewise, the edge states of graphene in contact with semiconductors or transition-metal dichalcogenides (TMDs) are expected to have a strong influence on the electrical properties of the resulting Schottky junction devices. We found that the edge states of graphene form chemical bonds with the ZnO layer, which limits the modulation of the Fermi level at the graphene-semiconductor junction, in a manner similar to Fermi level pinning in silicon devices. Therefore, we propose that graphene-based Schottky contact should be accomplished with minimal edge contact to reduce the limits imposed on the Fermi level modulation; this hypothesis has been experimentally verified, and its microscopic mechanism is further theoretically examined.-
dc.languageEnglish-
dc.publisherAMER CHEMICAL SOC-
dc.titlePerformance degradation in graphene-ZnO barristors due to graphene edge contact-
dc.typeArticle-
dc.identifier.wosid000543780900094-
dc.identifier.scopusid2-s2.0-85087110715-
dc.type.rimsART-
dc.citation.volume12-
dc.citation.issue25-
dc.citation.beginningpage28768-
dc.citation.endingpage28774-
dc.citation.publicationnameACS APPLIED MATERIALS & INTERFACES-
dc.identifier.doi10.1021/acsami.0c04325-
dc.contributor.localauthorKim, Yong-Hoon-
dc.contributor.nonIdAuthorKim, So-Young-
dc.contributor.nonIdAuthorKim, Min Jae-
dc.contributor.nonIdAuthorKim, Kiyung-
dc.contributor.nonIdAuthorLee, Yongsu-
dc.contributor.nonIdAuthorKim, Seung-Mo-
dc.contributor.nonIdAuthorHwang, Hyeon Jun-
dc.contributor.nonIdAuthorLee, Byoung Hun-
dc.description.isOpenAccessN-
dc.type.journalArticleArticle-
dc.subject.keywordAuthorgraphene barristor-
dc.subject.keywordAuthoredge contact-
dc.subject.keywordAuthorFermi level pinning-
dc.subject.keywordAuthorgraphene-semiconductor heterojunctions-
dc.subject.keywordAuthortransistors-
dc.subject.keywordPlusRESISTANCE-
dc.subject.keywordPlusTRANSPORT-
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