Fluorinated Epoxy Hybrid Material for Transparent Low-k Passivation Layer on Oxide Thin Film Transistors

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dc.contributor.authorLee, Injunko
dc.contributor.authorKim, Yonghoko
dc.contributor.authorShin, Jungcheolko
dc.contributor.authorPark, Sang-Hee Koko
dc.contributor.authorBae, Byeong-Sooko
dc.date.accessioned2020-07-07T02:21:01Z-
dc.date.available2020-07-07T02:21:01Z-
dc.date.created2020-05-28-
dc.date.issued2018-08-
dc.identifier.citation제 18회 국제정보디스플레이 학술대회(IMID 2018)-
dc.identifier.urihttp://hdl.handle.net/10203/275309-
dc.languageEnglish-
dc.publisher한국디스플레이산업협회-
dc.titleFluorinated Epoxy Hybrid Material for Transparent Low-k Passivation Layer on Oxide Thin Film Transistors-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.publicationname제 18회 국제정보디스플레이 학술대회(IMID 2018)-
dc.identifier.conferencecountryKO-
dc.identifier.conferencelocationBEXCO-
dc.contributor.localauthorPark, Sang-Hee Ko-
dc.contributor.localauthorBae, Byeong-Soo-
dc.contributor.nonIdAuthorShin, Jungcheol-
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MS-Conference Papers(학술회의논문)
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