ULTRA-LOW NOISE CHARACTERISTICS OF ALGAAS/INGAAS/GAAS PSEUDOMORPHIC HEMTS WITH WIDE HEAD T-SHAPED GATE

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dc.contributor.authorLee, JHko
dc.contributor.authorYoon, HSko
dc.contributor.authorPark, Chul Soonko
dc.contributor.authorPark, HMko
dc.date.accessioned2020-01-09T06:20:11Z-
dc.date.available2020-01-09T06:20:11Z-
dc.date.created2020-01-06-
dc.date.issued1995-06-
dc.identifier.citationIEEE ELECTRON DEVICE LETTERS, v.16, no.6, pp.271 - 273-
dc.identifier.issn0741-3106-
dc.identifier.urihttp://hdl.handle.net/10203/271018-
dc.description.abstractThe fully passivated low noise AlGaAs/InGaAs/GaAs pseudomorphic (PM) HEMT with 0.13 mu m T-shaped gate was fabricated using dose split electron beam lithography method (DSM). This device exhibited low noise figures of 0.31 and 0.45 dB at 12 and 18 GHz, respectively. These noise figures are the lowest value ever reported for the GaAs based HEMT's. These results are attributed to the extremely low gate resistance which results from wide head T-shaped gate having the higher ratio;more than 10 of gate head length to gate footprint.-
dc.languageEnglish-
dc.publisherIEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC-
dc.titleULTRA-LOW NOISE CHARACTERISTICS OF ALGAAS/INGAAS/GAAS PSEUDOMORPHIC HEMTS WITH WIDE HEAD T-SHAPED GATE-
dc.typeArticle-
dc.identifier.wosidA1995RA18200020-
dc.identifier.scopusid2-s2.0-0029322367-
dc.type.rimsART-
dc.citation.volume16-
dc.citation.issue6-
dc.citation.beginningpage271-
dc.citation.endingpage273-
dc.citation.publicationnameIEEE ELECTRON DEVICE LETTERS-
dc.identifier.doi10.1109/55.790732-
dc.contributor.localauthorPark, Chul Soon-
dc.contributor.nonIdAuthorLee, JH-
dc.contributor.nonIdAuthorYoon, HS-
dc.contributor.nonIdAuthorPark, HM-
dc.description.isOpenAccessN-
dc.type.journalArticleArticle-
dc.subject.keywordPlusMESFETS-
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