A Study on the Transition of Copper Oxide by the Incorporation of Nitrogen

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In the present study, the effects of nitrogen incorporation on the transition of a p-type copper oxide semiconductor are investigated. The properties of sputtered copper oxide and nitrogen-incorporated copper oxide are evaluated and compared at various nitrogen gas flow rates. The results indicate that the addition of nitrogen results in an increased optical bandgap, accompanied by significantly reduced tail states compared to pristine copper oxide. In addition, X-ray diffraction and X-ray photoelectron spectroscopy reveal that the incorporation of nitrogen stimulates the transition from copper (II) oxide to copper (I) oxide.
Publisher
MDPI
Issue Date
2019-10
Language
English
Article Type
Article
Citation

ELECTRONICS, v.8, no.10

ISSN
2079-9292
DOI
10.3390/electronics8101099
URI
http://hdl.handle.net/10203/269820
Appears in Collection
RIMS Journal Papers
Files in This Item
electronics-08-01099.pdf(2.9 MB)Download
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