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College of Natural Sciences(자연과학대학)Dept. of Chemistry(화학과)CH-Conference Papers(학술회의논문)

Dual responsive photoresists for sequential pattering by thermal imprint and photolithography

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dc.contributor.authorBak, Chang Hongko
dc.contributor.authorChoi, Soo-Youngko
dc.contributor.authorMin, Chang Suko
dc.contributor.authorKim, Jin-Baekko
dc.date.accessioned2019-04-16T02:10:54Z-
dc.date.available2019-04-16T02:10:54Z-
dc.date.created2014-01-10-
dc.date.issued2012-02-14-
dc.identifier.citation2012 Advanced lithography-
dc.identifier.urihttp://hdl.handle.net/10203/259835-
dc.languageEnglish-
dc.publisherSPIE Advanced Lithography-
dc.titleDual responsive photoresists for sequential pattering by thermal imprint and photolithography-
dc.typeConference-
dc.type.rimsCONF-
dc.citation.publicationname2012 Advanced lithography-
dc.identifier.conferencecountryUS-
dc.contributor.localauthorKim, Jin-Baek-
dc.contributor.nonIdAuthorBak, Chang Hong-
dc.contributor.nonIdAuthorChoi, Soo-Young-
dc.contributor.nonIdAuthorMin, Chang Su-
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CH-Conference Papers(학술회의논문)
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