Deposition of Rhenium Thin Film via an Electro-Spraying Method

Abstract

Rhenium (Re) metal has attracted as a promising refractory material to protect the components in high temperatllre rocket engines and hot gas valves becallse of its superior properties (high melting point of 3180 oC and high thermal shock resistance). Chemical vapor depos ition (CVD), one of the vacuum methods, has been generally lIsed for the fabrication of Re layer. However, CVD has some drawbacks sllch as complexity, high manufacturing cost, and high energy requirements. One possible alternative is an electrospraying method (non-vacuum process), which cOllld greatly reduce the manufacturing cost. 1n the present work, we have successfully deposited th e Re thin fi lm using the electro-spraying method. The inflllence of solution concentration and deposit ion time also investigated and discllssed in detai.