DC Field | Value | Language |
---|---|---|
dc.contributor.author | Kim, DY | ko |
dc.contributor.author | Ahn, SJ | ko |
dc.contributor.author | Kwon, Hyuk-Sang | ko |
dc.date.accessioned | 2011-12-09 | - |
dc.date.available | 2011-12-09 | - |
dc.date.created | 2012-02-06 | - |
dc.date.created | 2012-02-06 | - |
dc.date.issued | 2006-08 | - |
dc.identifier.citation | THIN SOLID FILMS, v.513, pp.212 - 216 | - |
dc.identifier.issn | 0040-6090 | - |
dc.identifier.uri | http://hdl.handle.net/10203/25759 | - |
dc.description.abstract | The structure of passive film formed on Ti in pH 8.5 buffer solution was examined by comparing the photocurrent for both the passive film and the thermally grown oxide on Ti in air at 400 degrees C. The passive films formed on Ti in pH 8.5 buffer solution showed optical band gap energy of 3.36 eV, while the thermally grown oxide film on Ti was found to have band gap energy of 3.1 eV. The higher value of band gap energy of passive film was attributed to the less crystalline or more disordered structure of passive film compared to that of the therinal oxide. This fact was supported by the higher disorder energy of passive film, determined from the absorption tail of photocurrent spectrum, than that of thermal oxide. (c) 2006 Elsevier B.V. All rights reserved. | - |
dc.description.sponsorship | This work was partly supported by Brain Korea 21 project. | en |
dc.language | English | - |
dc.language.iso | en_US | en |
dc.publisher | ELSEVIER SCIENCE SA | - |
dc.subject | ANODIC OXIDE-FILMS | - |
dc.subject | HYDROGEN EVOLUTION REACTION | - |
dc.subject | PHOTOCURRENT SPECTROSCOPY | - |
dc.subject | ELECTRONIC-PROPERTIES | - |
dc.subject | TITANIUM | - |
dc.subject | OXIDATION | - |
dc.subject | NIOBIUM | - |
dc.subject | GROWTH | - |
dc.subject | METAL | - |
dc.subject | FE | - |
dc.title | Photoelectrochemical analysis on the passive film formed on Ti in pH 8.5 buffer solution | - |
dc.type | Article | - |
dc.identifier.wosid | 000238963600035 | - |
dc.identifier.scopusid | 2-s2.0-33745434654 | - |
dc.type.rims | ART | - |
dc.citation.volume | 513 | - |
dc.citation.beginningpage | 212 | - |
dc.citation.endingpage | 216 | - |
dc.citation.publicationname | THIN SOLID FILMS | - |
dc.embargo.liftdate | 9999-12-31 | - |
dc.embargo.terms | 9999-12-31 | - |
dc.contributor.localauthor | Kwon, Hyuk-Sang | - |
dc.contributor.nonIdAuthor | Kim, DY | - |
dc.contributor.nonIdAuthor | Ahn, SJ | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordAuthor | Ti | - |
dc.subject.keywordAuthor | passive film | - |
dc.subject.keywordAuthor | thermal oxide | - |
dc.subject.keywordAuthor | photocurrent | - |
dc.subject.keywordPlus | ANODIC OXIDE-FILMS | - |
dc.subject.keywordPlus | HYDROGEN EVOLUTION REACTION | - |
dc.subject.keywordPlus | PHOTOCURRENT SPECTROSCOPY | - |
dc.subject.keywordPlus | ELECTRONIC-PROPERTIES | - |
dc.subject.keywordPlus | TITANIUM | - |
dc.subject.keywordPlus | OXIDATION | - |
dc.subject.keywordPlus | NIOBIUM | - |
dc.subject.keywordPlus | GROWTH | - |
dc.subject.keywordPlus | METAL | - |
dc.subject.keywordPlus | FE | - |
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