Electromigration-resistance Improvement of Cu Nano-wire by Reduced Graphene Oxide Coating
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 윤성준 | ko |
| dc.contributor.author | 조병진 | ko |
| dc.date.accessioned | 2019-04-15T15:53:16Z | - |
| dc.date.available | 2019-04-15T15:53:16Z | - |
| dc.date.created | 2014-05-01 | - |
| dc.date.issued | 2014-04-03 | - |
| dc.identifier.citation | The 1st Korean Graphene Symposium | - |
| dc.identifier.uri | http://hdl.handle.net/10203/255381 | - |
| dc.language | Korean | - |
| dc.publisher | 한국 그래핀 연구회 | - |
| dc.title | Electromigration-resistance Improvement of Cu Nano-wire by Reduced Graphene Oxide Coating | - |
| dc.type | Conference | - |
| dc.type.rims | CONF | - |
| dc.citation.publicationname | The 1st Korean Graphene Symposium | - |
| dc.identifier.conferencecountry | KO | - |
| dc.contributor.localauthor | 조병진 | - |
| dc.contributor.nonIdAuthor | 윤성준 | - |
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