PROPERTIES OF ALUMINUM-OXIDE FILMS PREPARED BY PLASMA-ENHANCED METAL ORGANIC-CHEMICAL VAPOR-DEPOSITION
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | KANG, CJ | ko |
| dc.contributor.author | Chun , Soung Soon | ko |
| dc.contributor.author | Lee, Won-Jong | ko |
| dc.date.accessioned | 2011-09-29T02:15:06Z | - |
| dc.date.available | 2011-09-29T02:15:06Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1990-08 | - |
| dc.identifier.citation | THIN SOLID FILMS, v.189, no.1, pp.161 - 173 | - |
| dc.identifier.issn | 0040-6090 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/25298 | - |
| dc.language | English | - |
| dc.language.iso | en_US | en |
| dc.publisher | ELSEVIER SCIENCE SA LAUSANNE | - |
| dc.title | PROPERTIES OF ALUMINUM-OXIDE FILMS PREPARED BY PLASMA-ENHANCED METAL ORGANIC-CHEMICAL VAPOR-DEPOSITION | - |
| dc.type | Article | - |
| dc.identifier.wosid | A1990DV25400017 | - |
| dc.identifier.scopusid | 2-s2.0-0025470527 | - |
| dc.type.rims | ART | - |
| dc.citation.volume | 189 | - |
| dc.citation.issue | 1 | - |
| dc.citation.beginningpage | 161 | - |
| dc.citation.endingpage | 173 | - |
| dc.citation.publicationname | THIN SOLID FILMS | - |
| dc.embargo.liftdate | 9999-12-31 | - |
| dc.embargo.terms | 9999-12-31 | - |
| dc.contributor.localauthor | Chun , Soung Soon | - |
| dc.contributor.localauthor | Lee, Won-Jong | - |
| dc.contributor.nonIdAuthor | KANG, CJ | - |
| dc.type.journalArticle | Article | - |
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