The thermal Effects annealing on the properties of plasma deposited SiN films
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | c. w. nam | ko |
| dc.contributor.author | s. i. woo | ko |
| dc.date.accessioned | 2019-03-06T20:59:06Z | - |
| dc.date.available | 2019-03-06T20:59:06Z | - |
| dc.date.created | 2012-02-06 | - |
| dc.date.issued | 1992 | - |
| dc.identifier.citation | THE KOREAN JOURNAL OF CHEMICAL ENGINEERING, v.3, no.1, pp.32 - 53 | - |
| dc.identifier.issn | 0256-1115 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/250771 | - |
| dc.language | Korean | - |
| dc.publisher | 한국화학공학회 | - |
| dc.title | The thermal Effects annealing on the properties of plasma deposited SiN films | - |
| dc.type | Article | - |
| dc.type.rims | ART | - |
| dc.citation.volume | 3 | - |
| dc.citation.issue | 1 | - |
| dc.citation.beginningpage | 32 | - |
| dc.citation.endingpage | 53 | - |
| dc.citation.publicationname | THE KOREAN JOURNAL OF CHEMICAL ENGINEERING | - |
| dc.contributor.localauthor | s. i. woo | - |
| dc.contributor.nonIdAuthor | c. w. nam | - |
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