On-Chip Curing by Microwave for Long Term Usage of Electronic Devices in Harsh Environments

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dc.contributor.authorPark, Jun-Youngko
dc.contributor.authorKim, Weon-Gukko
dc.contributor.authorBae, Hagyoulko
dc.contributor.authorJin, Ik Kyeongko
dc.contributor.authorKim, Da-Jinko
dc.contributor.authorIm, Hwonko
dc.contributor.authorTcho, Il-Woongko
dc.contributor.authorChoi, Yang-Kyuko
dc.date.accessioned2018-11-12T04:18:45Z-
dc.date.available2018-11-12T04:18:45Z-
dc.date.created2018-10-22-
dc.date.created2018-10-22-
dc.date.created2018-10-22-
dc.date.created2018-10-22-
dc.date.issued2018-10-
dc.identifier.citationSCIENTIFIC REPORTS, v.8-
dc.identifier.issn2045-2322-
dc.identifier.urihttp://hdl.handle.net/10203/246320-
dc.description.abstractMicrowave-induced thermal curing is demonstrated to improve the reliability and to prolong the lifetime of chips containing nanoscale electron devices. A film containing graphite powder with high microwave absorbing efficiency was fabricated at low cost. The film is flexible, bendable, foldable, and attachable to a chip. A commercial off-the-shelf chip and a representative 3-dimensional (3D) metaloxide-semiconductor field-effect transistor (MOSFET), known as FinFET, were utilized to verify the curing behaviors of the microwave-induced heat treatment. The heat effectively cured not only total ionizing dose (TID) damage from the external environment, but also internal electrical stress such as hot-carrier injection (HCI), which are representative sources of damages in MOSFET insulators. Then, the characteristics of the pre- and post-curing electron devices are investigated using electrical measurements and numerical simulations.-
dc.languageEnglish-
dc.publisherNATURE PUBLISHING GROUP-
dc.titleOn-Chip Curing by Microwave for Long Term Usage of Electronic Devices in Harsh Environments-
dc.typeArticle-
dc.identifier.wosid000446577500030-
dc.identifier.scopusid2-s2.0-85054582041-
dc.type.rimsART-
dc.citation.volume8-
dc.citation.publicationnameSCIENTIFIC REPORTS-
dc.identifier.doi10.1038/s41598-018-33309-x-
dc.contributor.localauthorChoi, Yang-Kyu-
dc.contributor.nonIdAuthorPark, Jun-Young-
dc.contributor.nonIdAuthorJin, Ik Kyeong-
dc.description.isOpenAccessY-
dc.type.journalArticleArticle-
dc.subject.keywordPlusCARBON NANOTUBES-
dc.subject.keywordPlusMOS OXIDES-
dc.subject.keywordPlusTEMPERATURE-
dc.subject.keywordPlusTRANSISTORS-
dc.subject.keywordPlusRADIATION-
dc.subject.keywordPlusPOWDER-
dc.subject.keywordPlusCARBON NANOTUBES-
dc.subject.keywordPlusMOS OXIDES-
dc.subject.keywordPlusTEMPERATURE-
dc.subject.keywordPlusTRANSISTORS-
dc.subject.keywordPlusRADIATION-
dc.subject.keywordPlusPOWDER-
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EE-Journal Papers(저널논문)
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