Frequency-dependent electrical and thermal response of heated atomic force microscope cantilevers

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dc.contributor.authorPark, Keunhanko
dc.contributor.authorLee, Jungchulko
dc.contributor.authorZhang, Zhuomin M.ko
dc.contributor.authorKing, William P.ko
dc.date.accessioned2018-09-18T06:02:28Z-
dc.date.available2018-09-18T06:02:28Z-
dc.date.created2018-08-21-
dc.date.created2018-08-21-
dc.date.issued2007-04-
dc.identifier.citationJOURNAL OF MICROELECTROMECHANICAL SYSTEMS, v.16, no.2, pp.213 - 222-
dc.identifier.issn1057-7157-
dc.identifier.urihttp://hdl.handle.net/10203/245501-
dc.description.abstractThis paper investigates the electrical and thermal response of the heated atomic force microscope (AFM) cantilevers in the frequency range from 10 Hz to I MHz. Spectrum analysis of the cantilever voltage response to periodic heating distinguishes different thermal behaviors of the cantilever in the frequency domain: the cantilever voltage at low frequencies is modulated by higher-order harmonics, and at high frequencies it oscillates with 1-omega only. A simple model facilitates the understanding of complicated electrical and thermal behaviors in the cantilever, thus, it is possible to determine the cantilever temperature. The calculation predicts that temperature oscillation is restricted to the heater region when the cantilever is operated at about 10 kHz, suggesting that the periodic-heating operation of the cantilever may be employed for highly sensitive thermal metrology.-
dc.languageEnglish-
dc.publisherIEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC-
dc.subjectDIP-PEN NANOLITHOGRAPHY-
dc.subjectDATA-STORAGE-
dc.subject3-OMEGA METHOD-
dc.subjectCONDUCTIVITY-
dc.subjectTIP-
dc.subjectMICROCANTILEVERS-
dc.subjectSENSITIVITY-
dc.subjectDEPOSITION-
dc.subjectSENSORS-
dc.subjectDESIGN-
dc.titleFrequency-dependent electrical and thermal response of heated atomic force microscope cantilevers-
dc.typeArticle-
dc.identifier.wosid000245695500004-
dc.identifier.scopusid2-s2.0-34147123195-
dc.type.rimsART-
dc.citation.volume16-
dc.citation.issue2-
dc.citation.beginningpage213-
dc.citation.endingpage222-
dc.citation.publicationnameJOURNAL OF MICROELECTROMECHANICAL SYSTEMS-
dc.identifier.doi10.1109/JMEMS.2006.889498-
dc.contributor.localauthorLee, Jungchul-
dc.contributor.nonIdAuthorPark, Keunhan-
dc.contributor.nonIdAuthorZhang, Zhuomin M.-
dc.contributor.nonIdAuthorKing, William P.-
dc.description.isOpenAccessN-
dc.type.journalArticleArticle-
dc.subject.keywordAuthoratomic force microscopy (AFM)-
dc.subject.keywordAuthorelectric variables measurement-
dc.subject.keywordAuthorfrequency response-
dc.subject.keywordAuthorRaman spectroscopy-
dc.subject.keywordPlusDIP-PEN NANOLITHOGRAPHY-
dc.subject.keywordPlusDATA-STORAGE-
dc.subject.keywordPlus3-OMEGA METHOD-
dc.subject.keywordPlusCONDUCTIVITY-
dc.subject.keywordPlusTIP-
dc.subject.keywordPlusMICROCANTILEVERS-
dc.subject.keywordPlusSENSITIVITY-
dc.subject.keywordPlusDEPOSITION-
dc.subject.keywordPlusSENSORS-
dc.subject.keywordPlusDESIGN-
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