Hierarchical honeycomb-patterned polydimethylsiloxane films with tunable nanostructures

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dc.contributor.authorYang, Young-Joko
dc.contributor.authorKim, Mun Hoko
dc.contributor.authorPark, O Okko
dc.date.accessioned2018-06-19T08:27:33Z-
dc.date.available2018-06-19T08:27:33Z-
dc.date.created2018-06-18-
dc.date.created2018-06-18-
dc.date.issued2018-08-
dc.identifier.citationMICROELECTRONIC ENGINEERING, v.195, pp.114 - 120-
dc.identifier.issn0167-9317-
dc.identifier.urihttp://hdl.handle.net/10203/242586-
dc.description.abstractThe preparation of hierarchical nanoporous films is of great significance for their potential applications, but the development of a facile method to synthesize such films method remains a great challenge. In the current work, hierarchically honeycomb-patterned polydimethylsiloxane (PDMS) films with unique nanostructures were synthesized by simply depositing an acid solution, specifically consisting of a mixture of H2SO4, HNO3, and DI water, on PDMS films displaying regular concave structures. During the post-processing, secondary extrusions were generated on the surfaces of such PDMS films, leading to the formation of highly hierarchical honeycomb-shaped patterns. In the synthesis, the composition of the acid solution played a critical role in the formation and growth of the secondary extrusions. The morphological evolution of the PDMS films during the post-processing proceeded along different pathways depending on the experimental conditions of the process. Based on our results and observations, a plausible mechanism explaining the formation of the hierarchical honeycomb-shaped patterns and the morphological evolution during the synthesis was proposed. The developed approach provides a simple route for fabricating polymer films with unique hierarchical honeycomb-shaped patterns and without the need for any expensive or sophisticated lithographic patterning instruments.-
dc.languageEnglish-
dc.publisherELSEVIER SCIENCE BV-
dc.subject3-DIMENSIONAL COLLOIDAL CRYSTALS-
dc.subjectSURFACE-
dc.subjectFABRICATION-
dc.subjectCARBON-
dc.subjectNANOFABRICATION-
dc.subjectSUPERLATTICES-
dc.subjectARRAYS-
dc.subjectCHIP-
dc.titleHierarchical honeycomb-patterned polydimethylsiloxane films with tunable nanostructures-
dc.typeArticle-
dc.identifier.wosid000433641200018-
dc.identifier.scopusid2-s2.0-85045399512-
dc.type.rimsART-
dc.citation.volume195-
dc.citation.beginningpage114-
dc.citation.endingpage120-
dc.citation.publicationnameMICROELECTRONIC ENGINEERING-
dc.identifier.doi10.1016/j.mee.2018.04.012-
dc.contributor.localauthorPark, O Ok-
dc.contributor.nonIdAuthorKim, Mun Ho-
dc.description.isOpenAccessN-
dc.type.journalArticleArticle-
dc.subject.keywordAuthorPoly(dimethylsiloxane)-
dc.subject.keywordAuthorHierarchical nanoporous film-
dc.subject.keywordAuthorColloidal lithography-
dc.subject.keywordAuthorNano-patteming-
dc.subject.keywordPlus3-DIMENSIONAL COLLOIDAL CRYSTALS-
dc.subject.keywordPlusSURFACE-
dc.subject.keywordPlusFABRICATION-
dc.subject.keywordPlusCARBON-
dc.subject.keywordPlusNANOFABRICATION-
dc.subject.keywordPlusSUPERLATTICES-
dc.subject.keywordPlusARRAYS-
dc.subject.keywordPlusCHIP-
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