DC Field | Value | Language |
---|---|---|
dc.contributor.author | Park, Woon Ik | ko |
dc.contributor.author | Choi, Young Joong | ko |
dc.contributor.author | Yuk, Jong Min | ko |
dc.contributor.author | Seo, Hyeon Kook | ko |
dc.contributor.author | Kim, Kwang Ho | ko |
dc.date.accessioned | 2018-05-23T06:31:17Z | - |
dc.date.available | 2018-05-23T06:31:17Z | - |
dc.date.created | 2018-04-18 | - |
dc.date.created | 2018-04-18 | - |
dc.date.issued | 2018-02 | - |
dc.identifier.citation | POLYMER JOURNAL, v.50, no.2, pp.221 - 229 | - |
dc.identifier.issn | 0032-3896 | - |
dc.identifier.uri | http://hdl.handle.net/10203/241542 | - |
dc.description.abstract | The formation of highly ordered patterns of block copolymers (BCPs) with high. is important for next-generation lithography applications. We demonstrate here a surface-engineering methodology to enhance the self-assembly of poly (styrene-b-dimethylsiloxane) (PS-b-PDMS) BCPs with high. by employing a hydroxyl-terminated polystyrene (PS-OH) brush. By precisely controlling the molecular weight (MW) and weight percent of PS-OH, well-ordered sub-20-nm BCP patterns were obtained over a large area in a short annealing time (< 10 min) with the use of guiding templates. We systemically analyzed how the PS-OH brush affects the self-assembly kinetics of BCPs with various MWs and volume fractions. Moreover, the transmission electron microscopy (TEM) results strongly support that the PS-modulated surface plays an important role in the ordering of BCP patterns. We also achieved well-aligned 12 nm line and 18 nm dot patterns within 3 min by means of binary solvent vapor annealing at a moderate temperature under the optimum PS-OH brush conditions. These results provide a new platform for effective engineering and manipulation of the self-assembly of other BCPs for advanced BCP nanotechnologies. | - |
dc.language | English | - |
dc.publisher | NATURE PUBLISHING GROUP | - |
dc.subject | PATTERNS | - |
dc.subject | NANOSTRUCTURES | - |
dc.subject | LITHOGRAPHY | - |
dc.subject | ORIENTATION | - |
dc.subject | BRUSHES | - |
dc.subject | ARRAYS | - |
dc.subject | GRAPHOEPITAXY | - |
dc.subject | MICRODOMAINS | - |
dc.subject | TEMPERATURE | - |
dc.subject | ORDER | - |
dc.title | Enhanced self-assembly of block copolymers by surface modification of a guiding template | - |
dc.type | Article | - |
dc.identifier.wosid | 000428781600007 | - |
dc.identifier.scopusid | 2-s2.0-85038399100 | - |
dc.type.rims | ART | - |
dc.citation.volume | 50 | - |
dc.citation.issue | 2 | - |
dc.citation.beginningpage | 221 | - |
dc.citation.endingpage | 229 | - |
dc.citation.publicationname | POLYMER JOURNAL | - |
dc.identifier.doi | 10.1038/s41428-017-0007-5 | - |
dc.contributor.localauthor | Yuk, Jong Min | - |
dc.contributor.nonIdAuthor | Park, Woon Ik | - |
dc.contributor.nonIdAuthor | Choi, Young Joong | - |
dc.contributor.nonIdAuthor | Kim, Kwang Ho | - |
dc.description.isOpenAccess | N | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordPlus | PATTERNS | - |
dc.subject.keywordPlus | NANOSTRUCTURES | - |
dc.subject.keywordPlus | LITHOGRAPHY | - |
dc.subject.keywordPlus | ORIENTATION | - |
dc.subject.keywordPlus | BRUSHES | - |
dc.subject.keywordPlus | ARRAYS | - |
dc.subject.keywordPlus | GRAPHOEPITAXY | - |
dc.subject.keywordPlus | MICRODOMAINS | - |
dc.subject.keywordPlus | TEMPERATURE | - |
dc.subject.keywordPlus | ORDER | - |
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