Low-temperature Epitaxial Growth of a Uniform Polycrystalline Si Film with Large Grains on SiO2 Substrate by Al-assisted Crystal Growth

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dc.contributor.authorAhn, Kyung-Minko
dc.contributor.authorKang, Seung-Moko
dc.contributor.authorMoon, Seon Hongko
dc.contributor.authorKwon, Hyuk-Sangko
dc.contributor.authorAhn, Byung Taeko
dc.date.accessioned2018-02-21T06:24:25Z-
dc.date.available2018-02-21T06:24:25Z-
dc.date.created2018-02-07-
dc.date.created2018-02-07-
dc.date.issued2013-12-
dc.identifier.citationCurrent Photovoltaic Research, v.1, no.2, pp.103 - 108-
dc.identifier.issn2288-3274-
dc.identifier.urihttp://hdl.handle.net/10203/240297-
dc.languageEnglish-
dc.publisherKorea Photovoltaic Society-
dc.titleLow-temperature Epitaxial Growth of a Uniform Polycrystalline Si Film with Large Grains on SiO2 Substrate by Al-assisted Crystal Growth-
dc.typeArticle-
dc.type.rimsART-
dc.citation.volume1-
dc.citation.issue2-
dc.citation.beginningpage103-
dc.citation.endingpage108-
dc.citation.publicationnameCurrent Photovoltaic Research-
dc.contributor.localauthorKwon, Hyuk-Sang-
dc.contributor.localauthorAhn, Byung Tae-
dc.contributor.nonIdAuthorMoon, Seon Hong-
dc.description.isOpenAccessN-
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