Universal Method for Creating Hierarchical Wrinkles on Thin-Film Surfaces

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One of the most interesting topics in physical science and materials science is the creation of complex wrinkled structures on thin-film surfaces because of their several advantages of high surface area, localized strain, and stress tolerance. In this study, a significant step was taken toward solving limitations imposed by the fabrication of previous artificial wrinkles. A universal method for preparing hierarchical three-dimensional wrinkle structures of thin films on a multiple scale (e.g., nanometers to micrometers) by sequential wrinkling with different skin layers was developed. Notably, this method was not limited to specific materials, and it was applicable to fabricating hierarchical wrinkles on all of the thin-film surfaces tested thus far, including those of metals, two-dimensional and one-dimensional materials, and polymers. The hierarchical wrinkles with multiscale structures were prepared by sequential wrinkling, in which a sacrificial layer was used as the additional skin layer between sequences. For example, a hierarchical MoS2 wrinkle exhibited highly enhanced catalytic behavior because of the superaerophobicity and effective surface area, which are related to topological effects. As the developed method can be adopted to a majority of thin films, it is thought to be a universal method for enhancing the physical properties of various materials.
Publisher
AMER CHEMICAL SOC
Issue Date
2018-01
Language
English
Article Type
Article
Keywords

HYDROGEN EVOLUTION REACTION; GRAPHENE OXIDE; MOS2; PATTERNS; LAYER; NANOCATALYSTS; NANOWRINKLES; ELECTRODES; MULTISCALE; NANOSHEETS

Citation

ACS APPLIED MATERIALS & INTERFACES, v.10, no.1, pp.1347 - 1355

ISSN
1944-8244
DOI
10.1021/acsami.7b14011
URI
http://hdl.handle.net/10203/240149
Appears in Collection
CBE-Journal Papers(저널논문)
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