Four-Bits-Per-Cell Operation in an HfO2-Based Resistive Switching Device

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dc.contributor.authorKim, Gun Hwanko
dc.contributor.authorJu, Hyunsuko
dc.contributor.authorYang, Min Kyuko
dc.contributor.authorLee, Dong Kyuko
dc.contributor.authorChoi, Ji Woonko
dc.contributor.authorJang, Jae Hyuckko
dc.contributor.authorLee, Sang Gilko
dc.contributor.authorCha, Ik Suko
dc.contributor.authorPark, Bo Keunko
dc.contributor.authorHan, Jeong Hwanko
dc.contributor.authorChung, Taek-Moko
dc.contributor.authorKim, Kyung Minko
dc.contributor.authorHwang, Cheol Seongko
dc.contributor.authorLee, Young Kukko
dc.date.accessioned2018-02-21T05:10:44Z-
dc.date.available2018-02-21T05:10:44Z-
dc.date.created2018-01-22-
dc.date.created2018-01-22-
dc.date.created2018-01-22-
dc.date.issued2017-10-
dc.identifier.citationSMALL, v.13, no.40-
dc.identifier.issn1613-6810-
dc.identifier.urihttp://hdl.handle.net/10203/239953-
dc.description.abstractThe quadruple-level cell technology is demonstrated in an Au/Al2O3/HfO2/TiN resistance switching memory device using the industry-standard incremental step pulse programming (ISPP) and error checking/correction (ECC) methods. With the highly optimistic properties of the tested device, such as self-compliance and gradual set-switching behaviors, the device shows 6s reliability up to 16 states with a state current gap value of 400 nA for the total allowable programmed current range from 2 to 11 mu A. It is demonstrated that the conventional ISPP/ECC can be applied to such resistance switching memory, which may greatly contribute to the commercialization of the device, especially competitively with NAND flash. A relatively minor improvement in the material and circuitry may enable even a five-bits-per-cell technology, which can hardly be imagined in NAND flash, whose state-of-the-art multiple-cell technology is only at three-level (eight states) to this day.-
dc.languageEnglish-
dc.publisherWILEY-V C H VERLAG GMBH-
dc.subjectTHERMAL AGITATION-
dc.subjectNAND FLASH-
dc.subjectMEMORY-
dc.subjectARCHITECTURE-
dc.subjectCONDUCTORS-
dc.subjectDIODE-
dc.subjectCOST-
dc.titleFour-Bits-Per-Cell Operation in an HfO2-Based Resistive Switching Device-
dc.typeArticle-
dc.identifier.wosid000413416400006-
dc.identifier.scopusid2-s2.0-85032855933-
dc.type.rimsART-
dc.citation.volume13-
dc.citation.issue40-
dc.citation.publicationnameSMALL-
dc.identifier.doi10.1002/smll.201701781-
dc.contributor.localauthorKim, Kyung Min-
dc.contributor.nonIdAuthorKim, Gun Hwan-
dc.contributor.nonIdAuthorJu, Hyunsu-
dc.contributor.nonIdAuthorYang, Min Kyu-
dc.contributor.nonIdAuthorLee, Dong Kyu-
dc.contributor.nonIdAuthorChoi, Ji Woon-
dc.contributor.nonIdAuthorJang, Jae Hyuck-
dc.contributor.nonIdAuthorLee, Sang Gil-
dc.contributor.nonIdAuthorCha, Ik Su-
dc.contributor.nonIdAuthorPark, Bo Keun-
dc.contributor.nonIdAuthorHan, Jeong Hwan-
dc.contributor.nonIdAuthorChung, Taek-Mo-
dc.contributor.nonIdAuthorHwang, Cheol Seong-
dc.contributor.nonIdAuthorLee, Young Kuk-
dc.description.isOpenAccessN-
dc.type.journalArticleArticle-
dc.subject.keywordPlusTHERMAL AGITATION-
dc.subject.keywordPlusMEMORY-
dc.subject.keywordPlusDIODE-
dc.subject.keywordPlusCOST-
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