SINGLE CRYSTALLINE METAL NANOPLATE AND THE FABRICATION METHOD THEREOF

Abstract

Disclosed is a fabrication method of a metal nanoplate using metal, metal halide or a mixture thereof as a precursor, wherein the single crystalline metal nanoplate is fabricated on a single crystalline substrate by performing heat treatment on a precursor including metal, metal halide or a mixture thereof and placed at a front portion of a reactor and the single crystalline substrate placed at a rear portion of the reactor under an inert gas flowing condition. A noble metal nanoplate of several micrometer size can be fabricated using a vapor-phase transport process without any catalyst, the process is simple and reproducible, the fabricated nanoplate is a single crystalline metal nanoplate having high crystallinity and high purity and not having a two-dimensional defect and impurities, a morphology of the metal nanoplate and an orientation of the metal nanoplate with respect to the substrate can be controlled by controlling a surface direction of the single crystalline substrate, and the metal nanoplate of several micrometer size is mass-producible.