Browse "RIMS Collection" by Subject etch reaction
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| Reaction characteristics between Cu thin film and RF inductively coupled Cl-2 plasma without/with UV irradiation Kwon, MS; Lee, JeongYong; Choi, KS; Han, CH, JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES REVIEW PAPERS, v.37, no.7, pp.4103 - 4108, 1998-07 |
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