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Showing results 1 to 4 of 4

1
A Study on the Electrical Properties of Atomic Layer Deposition Grown InOx on Flexible Substrates with Respect to N2O Plasma Treatment and the Associated Thin-Film Transistor Behavior under Repetitive Mechanical Stress

Sheng, Jiazhen; Park, Jozeph; Choi, Dong-won; Lim, Junhyung; Park, Jin-Seong, ACS APPLIED MATERIALS & INTERFACES, v.8, no.45, pp.31136 - 31143, 2016-11

2
Indium oxide thin film prepared by low temperature atomic layer deposition using liquid precursors and ozone oxidant

Maeng, W. J.; Choi, Dong-Won; Park, Jozeph; Park, Jin-Seong, JOURNAL OF ALLOYS AND COMPOUNDS, v.649, pp.216 - 221, 2015-11

3
Low-temperature n-type doping of insulating ultrathin amorphous indium oxide using H plasma-assisted annealing

Seo, Hojun; Lee, Sang Yeon; Lee, Jeongsu; Kim, Sunjin; Sul, Onejae; Seo, Hyungtak; Lee, Seung-Beck, NANOTECHNOLOGY, v.33, no.20, 2022-05

4
Reactive Adsorption of SO<sub>2</sub> and NO<sub>2</sub> Gases over Black Mass Derived from Discarded Alkaline Batteries

Gupta, Nishesh Kumar; Rajput, Kaptan; Achary, Srungarpu N.; Kim, Eun Ji; Mehta, Bijal R.; Roy, Debesh R.; Kim, Kwang Soo, ENERGY & FUELS, v.38, no.1, pp.545 - 554, 2023-12

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