Browse "RIMS Collection" by Subject ECR-PCVD

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Microcrystalline silicon films deposited by electron cyclotron resonance plasma chemical vapor deposition using helium gas

Lee, KE; Lee, WH; Shin, Sung-Chul; Lee, CC, JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, v.35, no.10A, pp.1241 - 1244, 1996-10

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