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LOW-PRESSURE CHEMICAL VAPOR-DEPOSITION OF BLANKET TUNGSTEN USING A GASEOUS MIXTURE OF WF6, SIH4, AND H2

PARK, HL; YOON, SS; Park, Chong-Ook; Chun , Soung Soon, THIN SOLID FILMS, v.181, no.1, pp.85 - 93, 1989-12

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