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EFFECTS OF ANNEALING CONDITIONS ON THE PROPERTIES OF TANTALUM OXIDE-FILMS ON SILICON SUBSTRATES PARK, SW; BAEK, YK; Park, Chong-Ook; PARK, CO; Lim, Ho Bin, JOURNAL OF ELECTRONIC MATERIALS, v.21, no.6, pp.635 - 639, 1992-06 |
EFFECTS OF OXIDATION CONDITIONS ON THE PROPERTIES OF TANTALUM OXIDE-FILMS ON SILICON SUBSTRATES PARK, SW; Lim, Ho Bin, THIN SOLID FILMS, v.207, no.1-2, pp.258 - 264, 1992-01 |
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