Method of fabricating patterned polymer film with nanometer scale
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | 양승만 | ko |
| dc.date.accessioned | 2017-12-20T11:16:52Z | - |
| dc.date.available | 2017-12-20T11:16:52Z | - |
| dc.date.issued | 2006-07-25 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/233754 | - |
| dc.description.abstract | A method of fabricating a patterned polymer film with nanometer scale includes filling particles each having a predetermined size in a pattern provided to a soft polymer mold to prepare an embossed stamp; placing the embossed stamp on a desired polymer film; allowing the embossed stamp placed on the polymer film to stand at temperatures higher than a glass transfer temperature of the polymer film for a predetermined time; and releasing the embossed stamp from the polymer film. Alternatively, the patterned polymer film is obtained by filling particles each having a predetermined size in a pattern provided to a soft polymer mold to prepare an embossed stamp; placing the embossed stamp on a coating layer of a polymer precursor formed on a substrate; curing the coating layer; and releasing the embossed stamp from the cured coating layer. | - |
| dc.title | Method of fabricating patterned polymer film with nanometer scale | - |
| dc.type | Patent | - |
| dc.type.rims | PAT | - |
| dc.contributor.localauthor | 양승만 | - |
| dc.contributor.assignee | KAIST | - |
| dc.identifier.iprsType | 특허 | - |
| dc.identifier.patentApplicationNumber | 10761277 | - |
| dc.identifier.patentRegistrationNumber | 7081269 | - |
| dc.date.application | 2004-01-22 | - |
| dc.date.registration | 2006-07-25 | - |
| dc.publisher.country | US | - |
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