DC Field | Value | Language |
---|---|---|
dc.contributor.author | 염도준 | ko |
dc.date.accessioned | 2017-12-20T11:16:43Z | - |
dc.date.available | 2017-12-20T11:16:43Z | - |
dc.date.issued | 2000-11-14 | - |
dc.identifier.uri | http://hdl.handle.net/10203/233748 | - |
dc.description.abstract | This invention relates to an apparatus and method for forming a high temperature superconducting film on a tape substrate. In this invention, the superconducting film is deposited on the tape substrate wound around a cylindrical substrate holder inserted in an auxiliary chamber. The holder rotates during the whole deposition process. Vapors of film materials are supplied from a main chamber through an opening between the two chambers. According to the present invention, it is possible to form a highly uniform high temperature superconducting film on a tape substrate at high speeds suitable for large scale production. The manufacturing speed can easily be controlled by the size of the substrate holder. | - |
dc.title | Apparatus and method for forming a film on a tape substrate | - |
dc.title.alternative | 띠형 기판상의 박막 형성 장치 및 박막형성방법 | - |
dc.type | Patent | - |
dc.type.rims | PAT | - |
dc.contributor.localauthor | 염도준 | - |
dc.contributor.assignee | KAIST | - |
dc.identifier.iprsType | 특허 | - |
dc.identifier.patentApplicationNumber | 09407892 | - |
dc.identifier.patentRegistrationNumber | 6147033 | - |
dc.date.application | 1999-09-29 | - |
dc.date.registration | 2000-11-14 | - |
dc.publisher.country | US | - |
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