Method of fabricating a dielectric-modulated field effect transistor comprising a biomolecules layer formed in a space where a sacrificial layer has been removed유전율-변화 전계효과 트랜지스터 및 그 제조 방법
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Choi, Yang-Kyu | ko |
| dc.contributor.author | Im, Hyungsoon | ko |
| dc.contributor.author | Gu, Bonsang | ko |
| dc.date.accessioned | 2017-12-20T10:24:37Z | - |
| dc.date.available | 2017-12-20T10:24:37Z | - |
| dc.date.issued | 2011-04-19 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/232388 | - |
| dc.title | Method of fabricating a dielectric-modulated field effect transistor comprising a biomolecules layer formed in a space where a sacrificial layer has been removed | - |
| dc.title.alternative | 유전율-변화 전계효과 트랜지스터 및 그 제조 방법 | - |
| dc.type | Patent | - |
| dc.type.rims | PAT | - |
| dc.contributor.localauthor | Choi, Yang-Kyu | - |
| dc.contributor.nonIdAuthor | Im, Hyungsoon | - |
| dc.contributor.nonIdAuthor | Gu, Bonsang | - |
| dc.contributor.assignee | KAIST | - |
| dc.identifier.iprsType | 특허 | - |
| dc.identifier.patentApplicationNumber | 12014380 | - |
| dc.identifier.patentRegistrationNumber | 7927887 | - |
| dc.date.application | 2008-01-15 | - |
| dc.date.registration | 2011-04-19 | - |
| dc.publisher.country | US | - |
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