Plasma device and substrate board treatment 플라즈마 장치와 기판 처리 장치

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The present invention relates to a kind of plasma generating equipment and substrate board treatment.Plasma generating equipment includes:Multiple dielectric tubes, the plurality of dielectric tube is separately mounted in the multiple through holes being formed in Dewar vessel;Antenna, based on arrangement symmetries of the antenna in the Dewar vessel, the antenna is divided into first antenna group and the second antenna sets, and is separately mounted to outside the dielectric tube;First RF power sources, a RF power sources are used to supply power to the first antenna group;2nd RF power sources, the 2nd RF power sources are used to supply power to second antenna sets;And first power distributing unit, first power distributing unit is arranged between the first antenna group and a RF power sources, by from the power distribution of a RF power sources to the first antenna group.
Assignee
한국과학기술원
Country
CC (Cocos Islands)
Issue Date
2017-04-12
Application Date
2012-10-02
Application Number
201280047361
Registration Date
2017-04-12
Registration Number
103843465 B
URI
http://hdl.handle.net/10203/229925
Appears in Collection
PH-Patent(특허)
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