DC Field | Value | Language |
---|---|---|
dc.contributor.author | Jin, Hyeong Min | ko |
dc.contributor.author | Park, Dae Yong | ko |
dc.contributor.author | Jeong, Seong-Jun | ko |
dc.contributor.author | Lee, Gil Yong | ko |
dc.contributor.author | Kim, Ju Young | ko |
dc.contributor.author | Mun, Jeong Ho | ko |
dc.contributor.author | Cha, Seung Keun | ko |
dc.contributor.author | Lim, Joonwon | ko |
dc.contributor.author | Kim, Jun Soo | ko |
dc.contributor.author | Kim, Kwang Ho | ko |
dc.contributor.author | Lee, Keon Jae | ko |
dc.contributor.author | Kim, Sang Ouk | ko |
dc.date.accessioned | 2017-10-23T02:00:41Z | - |
dc.date.available | 2017-10-23T02:00:41Z | - |
dc.date.created | 2017-10-10 | - |
dc.date.created | 2017-10-10 | - |
dc.date.issued | 2017-08 | - |
dc.identifier.citation | ADVANCED MATERIALS, v.29, no.32 | - |
dc.identifier.issn | 0935-9648 | - |
dc.identifier.uri | http://hdl.handle.net/10203/226459 | - |
dc.description.abstract | One of the fundamental challenges encountered in successful incorporation of directed self-assembly in sub-10 nm scale practical nanolithography is the process compatibility of block copolymers with a high Flory-Huggins interaction parameter (chi). Herein, reliable, fab-compatible, and ultrafast directed self-assembly of high-chi block copolymers is achieved with intense flash light. The instantaneous heating/quenching process over an extremely high temperature (over 600 degrees C) by flash light irradiation enables large grain growth of sub-10 nm scale self-assembled nanopatterns without thermal degradation or dewetting in a millisecond time scale. A rapid self-assembly mechanism for a highly ordered morphology is identified based on the kinetics and thermodynamics of the block copolymers with strong segregation. Furthermore, this novel self-assembly mechanism is combined with graphoepitaxy to demonstrate the feasibility of ultrafast directed self-assembly of sub-10 nm nanopatterns over a large area. A chemically modified graphene film is used as a flexible and conformal light-absorbing layer. Subsequently, transparent and mechanically flexible nanolithography with a millisecond photothermal process is achieved leading the way for roll-to-roll processability. | - |
dc.language | English | - |
dc.publisher | WILEY-V C H VERLAG GMBH | - |
dc.subject | CHEMICALLY-MODIFIED GRAPHENE | - |
dc.subject | THIN-FILMS | - |
dc.subject | POLY(METHYL METHACRYLATE) | - |
dc.subject | MICROPHASE SEPARATION | - |
dc.subject | LASER CRYSTALLIZATION | - |
dc.subject | INTERACTION PARAMETER | - |
dc.subject | DEFECT ANNIHILATION | - |
dc.subject | SILICON FILMS | - |
dc.subject | PULSED-LASER | - |
dc.subject | LITHOGRAPHY | - |
dc.title | Flash Light Millisecond Self-Assembly of High chi Block Copolymers for Wafer-Scale Sub-10 nm Nanopatterning | - |
dc.type | Article | - |
dc.identifier.wosid | 000407995100013 | - |
dc.identifier.scopusid | 2-s2.0-85021082186 | - |
dc.type.rims | ART | - |
dc.citation.volume | 29 | - |
dc.citation.issue | 32 | - |
dc.citation.publicationname | ADVANCED MATERIALS | - |
dc.identifier.doi | 10.1002/adma.201700595 | - |
dc.contributor.localauthor | Lee, Keon Jae | - |
dc.contributor.localauthor | Kim, Sang Ouk | - |
dc.contributor.nonIdAuthor | Jeong, Seong-Jun | - |
dc.contributor.nonIdAuthor | Kim, Jun Soo | - |
dc.contributor.nonIdAuthor | Kim, Kwang Ho | - |
dc.description.isOpenAccess | N | - |
dc.type.journalArticle | Article | - |
dc.subject.keywordAuthor | block copolymers | - |
dc.subject.keywordAuthor | directed self-assembly | - |
dc.subject.keywordAuthor | flash light | - |
dc.subject.keywordAuthor | photothermal effects | - |
dc.subject.keywordPlus | CHEMICALLY-MODIFIED GRAPHENE | - |
dc.subject.keywordPlus | THIN-FILMS | - |
dc.subject.keywordPlus | POLY(METHYL METHACRYLATE) | - |
dc.subject.keywordPlus | MICROPHASE SEPARATION | - |
dc.subject.keywordPlus | LASER CRYSTALLIZATION | - |
dc.subject.keywordPlus | INTERACTION PARAMETER | - |
dc.subject.keywordPlus | DEFECT ANNIHILATION | - |
dc.subject.keywordPlus | SILICON FILMS | - |
dc.subject.keywordPlus | PULSED-LASER | - |
dc.subject.keywordPlus | LITHOGRAPHY | - |
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