On the characteristics of multiple inductively coupled plasma sources using two coils

Abstract

The need for more precise process has increased since width of device decreases and transistors density per wafer increases. Multiple ICP source using several small sources in parallel connection ignite high-density plasma at low temperature and low pressure because more power can be applied. Also uniform plasma can be ignited because power can be equally distributed to each coil. In this thesis, we study basic characteristics of 1-coil based on the electrical characteristics trend on mode transition and calculated result from circuit model. We investigate on power distribution characteristics, pressure and frequency dependance for multiple ICP sources based on 2-coil experiment.