Effect of deposition temperature on surface morphology and magnetic properties in epitaxial CoFe2O4 thin films deposited by metal organic chemical vapor deposition

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dc.contributor.authorPan, M.ko
dc.contributor.authorBai, G.ko
dc.contributor.authorLiu, Y.ko
dc.contributor.authorHong, S.ko
dc.contributor.authorDravid, V. P.ko
dc.contributor.authorPetford-Long, A. K.ko
dc.date.accessioned2017-02-02T01:55:33Z-
dc.date.available2017-02-02T01:55:33Z-
dc.date.created2017-01-17-
dc.date.created2017-01-17-
dc.date.issued2010-02-
dc.identifier.citationJOURNAL OF APPLIED PHYSICS, v.107, no.4-
dc.identifier.issn0021-8979-
dc.identifier.urihttp://hdl.handle.net/10203/220283-
dc.description.abstractWe have successfully grown epitaxial CoFe2O4 (CFO) thin film on SrTiO3 by metal organic chemical vapor deposition. In order to understand the surface structure and its correlation with magnetic properties, CFO thin films were deposited at a range of deposition temperatures. As the deposition temperature is decreased, a huge effect on film morphology and surface roughness is observed, resulting from a change in the size and density of the crystal nuclei. These changes to grain structure and surface roughness modify the energy landscape of the films and are major contributors to the change in magnetic properties as a function of deposition temperature: the direction of the easy axis is aligned in-plane at lower deposition temperatures and lower anisotropy between different directions is observed in the rough films grown at high temperature.-
dc.languageEnglish-
dc.publisherAMER INST PHYSICS-
dc.subjectULTRATHIN FILMS-
dc.subjectCOBALT FERRITE-
dc.subjectFE3O4 FILMS-
dc.subjectANISOTROPY-
dc.subjectBEHAVIOR-
dc.subjectGROWTH-
dc.subjectENERGY-
dc.subjectSPINEL-
dc.subjectORIGIN-
dc.titleEffect of deposition temperature on surface morphology and magnetic properties in epitaxial CoFe2O4 thin films deposited by metal organic chemical vapor deposition-
dc.typeArticle-
dc.identifier.wosid000275028900065-
dc.identifier.scopusid2-s2.0-77749298623-
dc.type.rimsART-
dc.citation.volume107-
dc.citation.issue4-
dc.citation.publicationnameJOURNAL OF APPLIED PHYSICS-
dc.identifier.doi10.1063/1.3312011-
dc.contributor.localauthorHong, S.-
dc.contributor.nonIdAuthorPan, M.-
dc.contributor.nonIdAuthorBai, G.-
dc.contributor.nonIdAuthorLiu, Y.-
dc.contributor.nonIdAuthorDravid, V. P.-
dc.contributor.nonIdAuthorPetford-Long, A. K.-
dc.description.isOpenAccessN-
dc.type.journalArticleArticle-
dc.subject.keywordAuthorcobalt compounds-
dc.subject.keywordAuthorcrystal microstructure-
dc.subject.keywordAuthormagnetic anisotropy-
dc.subject.keywordAuthorMOCVD-
dc.subject.keywordAuthorsurface morphology-
dc.subject.keywordAuthorsurface roughness-
dc.subject.keywordAuthorvapour phase epitaxial growth-
dc.subject.keywordPlusULTRATHIN FILMS-
dc.subject.keywordPlusCOBALT FERRITE-
dc.subject.keywordPlusFE3O4 FILMS-
dc.subject.keywordPlusANISOTROPY-
dc.subject.keywordPlusBEHAVIOR-
dc.subject.keywordPlusGROWTH-
dc.subject.keywordPlusENERGY-
dc.subject.keywordPlusSPINEL-
dc.subject.keywordPlusORIGIN-
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