REDUCTION OF LATERAL PHOSPHORUS DIFFUSION IN CMOS NORMAL-WELLS
| DC Field | Value | Language |
|---|---|---|
| dc.contributor.author | Ahn, SungTae | ko |
| dc.contributor.author | KENNEL, HW | ko |
| dc.contributor.author | PLUMMER, JD | ko |
| dc.contributor.author | TILLER, WA | ko |
| dc.date.accessioned | 2016-11-30T01:50:50Z | - |
| dc.date.available | 2016-11-30T01:50:50Z | - |
| dc.date.created | 2016-11-10 | - |
| dc.date.created | 2016-11-10 | - |
| dc.date.issued | 1990-03 | - |
| dc.identifier.citation | IEEE TRANSACTIONS ON ELECTRON DEVICES, v.37, no.3, pp.806 - 807 | - |
| dc.identifier.issn | 0018-9383 | - |
| dc.identifier.uri | http://hdl.handle.net/10203/214183 | - |
| dc.language | English | - |
| dc.publisher | IEEE-INST ELECTRICAL ELECTRONICS ENGINEERS INC | - |
| dc.title | REDUCTION OF LATERAL PHOSPHORUS DIFFUSION IN CMOS NORMAL-WELLS | - |
| dc.type | Article | - |
| dc.identifier.wosid | A1990CR84400039 | - |
| dc.identifier.scopusid | 2-s2.0-0025401608 | - |
| dc.type.rims | ART | - |
| dc.citation.volume | 37 | - |
| dc.citation.issue | 3 | - |
| dc.citation.beginningpage | 806 | - |
| dc.citation.endingpage | 807 | - |
| dc.citation.publicationname | IEEE TRANSACTIONS ON ELECTRON DEVICES | - |
| dc.identifier.doi | 10.1109/16.47790 | - |
| dc.contributor.localauthor | Ahn, SungTae | - |
| dc.contributor.nonIdAuthor | KENNEL, HW | - |
| dc.contributor.nonIdAuthor | PLUMMER, JD | - |
| dc.contributor.nonIdAuthor | TILLER, WA | - |
| dc.description.isOpenAccess | N | - |
| dc.type.journalArticle | Note | - |
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